Visible microlaser two-photon polymerization in a microfludic cell: A resist study

Abstract:

Two-photon polymerization with a visible micro-laser is used to polymerize several resists in a microfluidic channel. The minimum resolution that is achievable, named voxel, is estimated using an ascending scan method for different photosensitive polymers: standard microelectronics resists such as SU8 and AZ1512HS – construction resists such as PEG based and 3015 – electrically movable resist based on 4-HBA. Once extracted the polymerization parameters for creating and overlapping voxels, complex 3D structures are built inside the microfluidic channel. Thanks to microfluidics, the resist flow is stabilized during the microfabrication process. Finally, an electro-sensible arm is created with both PEG and 4-HBA based resists. A micrometer-range displacement of this arm is observed under electrical field actuation normal to the arm axe.

Authors:

T. Honeggera, T. Elmberga, K. Bertona and D. Peyrade

References:

© 2011 Published by Elsevier B.V.  -  MEE 7634,  10 January 2011